atomicoat

Atomic Layer Deposition

Free · Designed for iPad

Full-screen graph expansion! Analyze 6 hours of data with interactive tooltips. Enhanced real-time updates, better reliability, and smoother performance. Upgrade now! ALD Control System – Precision in Atomic Layer Deposition The ALD Control System is a powerful tool designed for managing and monitoring Atomic Layer Deposition (ALD) processes with precision, reliability, and ease. Tailored for researchers, engineers, and labs, our system simplifies complex deposition workflows, ensuring high-quality thin-film production through advanced automation and real-time monitoring. Key Features: • Recipe Management: Create, edit, and execute predefined process recipes for consistent deposition cycles. Control each step with precise parameter settings, including gas flow rates, temperature, and pressure. • Real-Time Monitoring: Track critical parameters such as chamber conditions, component states, and sensor readings in real time. Ensure process accuracy and safety with continuous monitoring. • Automated Experiment Recording: Record every process execution as an “experiment” with detailed logs of parameters, deviations, and alerts. Access structured data for later review, analysis, and optimization. • Session Management: Enforce single-operator sessions for focused control and accountability. Secure access ensures only authorized users can operate the machine. • Data Logging and Analysis: Automatically collect and store process data, allowing for in-depth analysis, quality control, and process improvement over time. • Built-In Safety Features: Continuous validation of process parameters with automatic safety interventions. Prevent errors and maintain optimal conditions with smart alerts and safeguards. Designed for Professionals: • Independent Machine Control: Each machine operates individually for maximum precision and safety. • Scalable Architecture: Ideal for labs and industries managing multiple deposition machines. • User-Friendly Interface: A streamlined design enables operators to control processes with minimal training. Whether you’re performing R&D, optimizing deposition recipes, or scaling up production, the ALD Control System delivers the tools and insights you need to achieve consistent and high-quality results.

  • This app hasn’t received enough ratings or reviews to display an overview.

What's New in Version 5.2.0 Transform your ALD process monitoring with powerful new features! NEW: Full-Screen Graph Analysis Tap any mini graph to expand it with extended time windows (5 minutes to 6 hours), interactive tooltips, and pause/resume controls for detailed analysis. Enhanced Real-Time Performance Experience faster, more reliable real-time updates with our improved telemetry system. Better Reliability Fixed critical bugs and improved validation to ensure your recipes execute flawlessly. Polished Experience Smoother animations, better visual feedback, and an overall more polished user experience.

The developer, AtomiCoat, indicated that the app’s privacy practices may include handling of data as described below. For more information, see the developer’s privacy policy .

  • Data Not Collected

    The developer does not collect any data from this app.

    Privacy practices may vary, for example, based on the features you use or your age. Learn More

    The developer has not yet indicated which accessibility features this app supports. Learn More

    • Seller
      • ATOMICOAT TEKNOLOJI VE URETIM ANONIM SIRKETI
    • Size
      • 26.3 MB
    • Category
      • Business
    • Compatibility
      Requires iOS 13.0 or later.
      • iPhone
        Requires iOS 13.0 or later.
      • iPad
        Requires iPadOS 13.0 or later.
      • iPod touch
        Requires iOS 13.0 or later.
      • Mac
        Requires macOS 11.0 or later and a Mac with Apple M1 chip or later.
      • Apple Vision
        Requires visionOS 1.0 or later.
    • Languages
      • English
    • Age Rating
      4+
    • Copyright
      • © 2025 ATOMICOAT INC.